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Thin Solid Films 520, 19 (2012) 6050
Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing
Janyce Franc 1, 2, Vincent Barnier ( ) 3, 4, Francis Vocanson ( ) 2, Émilie Gamet 2, Marilyne Lesage 2, Damien Jamon 5, Yves Jourlin ( ) 2
(30/03/2012)

The aim of this study is the elaboration of a high index sol-gel material in order to prepare submicrometric grating. The gratings were obtained after few seconds of UV exposure in one step using an organically modified silica-hafnia matrix. The chemical composition of thin films after UV and annealing treatments were studied using Fourier Transform Infrared Spectroscopy and X-Ray Photoelectron Spectroscopy. The study of optical properties revealed that the annealed films are transparent from 200 to 1000 nm and have a refractive index from 1.550 to 1.701 depending on the hafnium concentration.
1 :  Laboratoire des matériaux avancés (LMA)
CNRS : USR3264 – IN2P3 – Université Claude Bernard - Lyon I
2 :  LAboratoire Hubert Curien [Saint Etienne] (LHC)
CNRS : UMR5516 – Université Jean Monnet - Saint-Etienne
3 :  Département Mécanique physique et interfaces (MPI-ENSMSE)
École Nationale Supérieure des Mines - Saint-Étienne – SMS
4 :  UMR 5146 - Laboratoire Claude Goux (LCG-ENSMSE)
École Nationale Supérieure des Mines - Saint-Étienne
5 :  Laboratoire Telecom Claude Chappe (LT2C)
Ecole d'ingenieurs Telecom Saint Etienne – Université Jean Monnet - Saint-Etienne : EA3523
Chimie/Matériaux

Sciences de l'ingénieur/Matériaux
Photosensitivity – Thin Films – Sol-gel Deposition – Silica – Hafnia – X-ray photoelectron Spectroscopy – Diffraction gratings